Abstract：Scanning electron microscope (SEM) is an effective tool in microstructure analysis and measurement.The surface of various materials can be analyzed by SEM.SEM has become one of the main measurement tool especially for micro-nano geometry measurement under 100 nm.The instrument of the metrological SEM is developed for calibration nanostructure and realized the traceability of SEM.The 2 dimensional structure of sample is obtained by stage scanning, and the measured result is traced to laser wavelength by interferometer.The nano structure dimension is measured and traced to SI unit.The SEM calibration artifact is measured by this instrument and the uncertainty is evaluated,and an uncertainty better than 20 nm is obtained for grating artifices.
缪琦,高思田,李伟,施玉书,李琪,卢荣胜. 计量型扫描电镜及测量不确定度分析[J]. 计量学报, 2014, 35(z1): 49-53.
MIAO Qi,GAO Si-tian,LI Wei,SHI Yu-shu,LI Qi,LU Rong-sheng. Evaluation of the Uncertainty for the Measurement of Micro-nano Geometric Structure by Metrological SEM. Acta Metrologica Sinica, 2014, 35(z1): 49-53.
2014, Vol. 35 
