Evaluation of Uncertainty in Measurement with White-light Interference System
CAI Xiao-yu1,2, WEI Jia-si2, SUN Kai-xi2,3, LIU Na2,3, ZHANG Xue-dian1, ZHUANG Song-lin1
1. School of Optoelectronic Information and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China
2. Shanghai Institute of Measurement and Testing Technology, Shanghai 201203, China
3. Shanghai Jice Information Technology Co. Ltd., Shanghai 200234, China
Abstract：White-light interference system (WLIS) is widely used in the measurement of micro-nano surface morpography. The evaluation of measurement uncertainty is an important work to study the metrological characteristics of WLIS. The measurement models of pitch and step height by WLIS were built and the sources of uncertainty were determined. A 50× objective lens was used to measure a pitch standard and a step height standard, which nominal values are 5000 nm and 180 nm respectively. By analyzing the measurement repeatability, optical component quality, sensor parameters, motion module performance, test method and environment of WLIS, the combined measurement uncertainty of pitch and step height measurement are evaluated as 21 nm and 0.4 nm. The uncertainty analysis of WLIS ensures the accuracy and traceability of the measurement results, therefore, provides necessary references for dissemination of the nano-micro dimensional values by WLIS.
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2021, Vol. 42 
