A Novel Calibration Method at On-Wafer Measurement System Affected by Leakage
WANG Yi-bang1,WU Ai-hua1,LIU Chen1,LIANG Fa-guo1,LUAN Peng1,HUO Ye1,SUN Jing1,ZHAO Wei2
1. The 13th Research Institute of China Electronics Technology Group Corporation, Shijiazhuang, Hebei 050051, China
2. Xidian University, Xi′an, Shaanxi 710071, China
Abstract：The conventional calibration method for high frequency on-wafer scattering parameters comprises 16-term error model and two-tier crosstalk correction method based on Multiline TRL, both of which did well at charactering the leakage in measurement system. A novel method is proposed here, taking the leakage in measurement system as a parallel two-port network with the device under test (DUT). The method is divided into two parts. Firstly apply the SOLR calibration method to obtain the eight-term basic error box, then measure a crosstalk standard (could be an open standard in SOLR) to deduce the crosstalk error box. Simulation and measurement results show that, the accuracy of the novel method is comparative to the 16-term method with four less calibration kits, and has a positive response at the crosstalk, and also the novel method improved test efficiency.
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2021, Vol. 42 
