Abstract：Contact surface topography measuring instruments are commonly utilized for assessing variables such as surface roughness, geometric shapes, and waviness. Nevertheless, the convolution effect produced by the probe’s interaction with the test surface can result in measurement distortion. An analysis is performed on the distortion mechanism influenced by the geometric characteristics of the probe, classifying distortions based on their properties into conventional and complex distortions. In response to the distortion phenomena caused by the compound effects of a spherical probe tip and cone angles, a multimodal recognition method for complex distortion is proposed. Experimental outcomes indicate that compared to the limitations of single-mode recognition of conventional distortions by the topography measuring instrument, the proposed method could effectively identify complex distortions present in topography measurement results. Moreover, it offers a credible interpretation of the measurement results, providing a novel strategy for the accurate identification and correction of distorted data within these results.
SUN Y L, CHANG S P. Analysis and Compensation of the Nonlinear Error Based on Contact Surface Profile Measurement ［J］. Acta Metrologica Sinica, 2016, 37 (6): 563-566.
SHI Z M, ZHANG S, SHI Y S, et al. Evaluation of the Uncertainty for the Measurement of Surface Roughness by Low-noise Probing System ［J］. Acta Metrologica Sinica, 2022, 43(9): 1122-1127.
HE B F, DING S Y, WEI C E, et al. Review of Measurement Methods for Areal Surface Roughness ［J］. Optics and Precision Engineering, 2019, 27(1): 78-93.
BU X P, ZHANG S, PI L, et al. Research on the Key Technology of the Automatic Measurement System for Surface Roughness International Comparison ［J］. Acta Metrologica Sinica, 2022, 43(7): 844-850.
SHI Y S, LIAN X Y, WANG Y X, et al. Simiulation of AFM Scanning Process and Tip Shape Estimation ［J］. Acta Metrologica Sinica, 2019, 40(2): 177-182.
［7］
TIAN A L, LIU X, CHETWYND D G, et al. Stylus contact on short wavelength random surfaces: a simulation study ［J］. Measurement Science and Technology, 2007, 18(6): 1694-1697.
［9］
VORBURGER T V, ZHENG A, RENEGAR T B, et al. An iterative algorithm for calculating stylus radius unambiguously ［J］.Journal of Physics: Conference Series,2011, 311(1): 012029.
［11］
PARK J, KWON K, CHO N. Development of a coordinate measuring machine (CMM) touch probe using a multi-axis force sensor ［J］. Measurement Science and Technology, 2006, 17(9): 2380-2383.
LIU J, GU K, LI M Z, et al. Calibration Method for Depth Measurement of Nano/microstructure in Scanning Probe Microscopy ［J］. Acta Metrologica Sinica, 2019, 40 (4): 549-556.
［13］
CANET F J, CORONADO E, FORMENT A A, et al. Correction of the tip convolution effects in the imaging of nanostructures studied through scanning force microscopy ［J］. Nanotechnology, 2014, 25(39): 395703.
［15］
LAHAT D, ADALI T, JUTTEN C. Multimodal data fusion: an overview of methods, challenges, and prospects ［J］. Proceedings of the IEEE, 2015, 103(9): 1449-1477.
［16］
TURK M. Multimodal interaction: A review ［J］. Pattern recognition letters, 2014, 36: 189-195.
WANG Z Y, FU J H, MENG H. Modified Least Square Reference Line for Surface Roughness Evaluation ［J］. Acta Metrologica Sinica, 2008, 29 (3): 203-206.
XU J X, YOU Q. Uncertainty Calculation for Arbitrary Order Polynomial Least-square Fitting and Analysis of the Best Fitting Order ［J］. Acta Metrologica Sinica, 2020, 41(3): 388-392.
［8］
CHEN S G, WU J Y. Estimating normal vectors and curvatures by centroid weights ［J］. Computer Aided Geometric Design, 2004, 21(5): 447-458.
［10］
LEE D H. 3-Dimensional profile distortion measured by stylus type surface profilometer ［J］. Measurement, 2013, 46(1): 803-814.11.
CHEN C C A, LIN C C, CHEN R. Stylus measurement and error analysis of large slope angle lens ［C］// Advanced Manfacture: Focusing on New and Emerging Technologies. 2008: 312-323.
WU J J. Spectral analysis for the effects of stylus tip curvature on measuring isotropic rough surfaces ［J］. Measurement Science and Technology, 2002, 13(5): 720-723.
2024, Vol. 45 
