Abstract：In order to realize the calibration of critical dimension measuring instruments in the semiconductor industry, research work on nano-size line width standard samples has been launched.The nano-size line width standard samples with sizes of 20nm and 50nm were prepared by multi-layer film deposition technology.Aiming at the problem that it is difficult to find out when calibrating due to the small overall size of the standard template and the small measuring field of view of the instrument, and the problem that the quality of the template line edge leads to too large difference in the results of different positions measured each time, the positioning and tracking signs were designed. A total of 9 groups of signs were designed, each group of signs had 9 marker grids, the width of each sign was 0.5μm, and the interval of the signs was 2.5μm, the distance between each group of marks was 100μm.The semiconductor process can quickly and accurately find the standard measurement position, ensure the repeatability of each measurement result, and effectively improve the measurement speed and accuracy.
赵琳,韩志国,张晓东,许晓青,李锁印,吴爱华. 基于多层膜沉积的循迹式线宽标准样片[J]. 计量学报, 2022, 43(12): 1549-1553.
ZHAO Lin,HAN Zhi-guo,ZHANG Xiao-dong,XU Xiao-qing,LI Suo-yin,WU Ai-hua. Tracking Type Line Width Standard Sample Based on Multilayer Film Deposition. Acta Metrologica Sinica, 2022, 43(12): 1549-1553.
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2022, Vol. 43 
