|
|
nternational Key Comparison CCQM-K67:Surface Analysis Measurement of Composition for Fe-Ni Alloy Film |
WANG Hai1,SONG Xiao-ping1,CHENG Bin2,FENG Ying3 |
1. National Institute of Metrology, Beijing 100013, China
2. Analysis and Testing Center of Beijing University of Chemical Technology, Beijing 100029, China
3. Biochemical Engineering College of Beijing Union University, Beijing 100023, China |
|
|
Abstract Based on X-ray photoelectron spectroscopy technique,the National Institute of Metrology of China developed an accurate analytical method and took part in the CCQM-K67 international key comparison on surface analysis measurement of the composition for Fe-Ni alloy film.According to the recently published comparison results, the measured Fe atom fraction (51.48%) by the National Institute of Metrology of China was agreed with the reference value (50.02%) of the CCQM-K67 key comparison.
|
|
|
|
|
|
[1] Baer D R. Improving surface-analysis methods for characterization of advanced materials by development of standards,reference data,and interlaboratory comparisons [J]. Surface and Interface Analysis,2007,39(4): 283-293.
[2]Grant J T, Williams P, Fine J, et al. The status of reference data,reference materials and reference procedures in surface analysis [J]. Surface and Interface Analysis,1988,13(1): 46-50.
[3]Seah M P, Spencer S J, Bensebaa F, et al. Critical review of the current status of thickness measurements for ultrathin SiO2 on Si Part V: Results of a CCQM pilot study [J]. Surface and Interface Analysis,2004,36(9): 1269-1303.
[4]Seah M P. Intercomparison of silicon dioxide thickness measurements made by multiple techniques: the route to accuracy [J]. Journal of vacuum science & technology A: vacuum,surfaces,and films,2004,22(4): 1564-1571.
[5]Seah M P. CCQM-K32 key comparison and P84 pilot study: amount of silicon oxide as a thickness of SiO2 on Si [J]. Metrologia,2008,45(1A): Technical supplement 08013.
[6]Seah M P, Unger W E S, Wang H, et al. Ultra-thin SiO2 on Si IX: absolute measurements of the amount of silicon oxide as a thickness of SiO2 on Si [J]. Surface and Interface Analysis,2009,41(5): 430-439.
[7]Kim K J, Moon D W, Park C J, et al. Quantitative surface analysis of Fe-Ni alloy films by XPS,AES and SIMS [J]. Surface and Interface Analysis,2007,39(8): 665-673.
[8]Kim K J,Moon D W, Hayashi T, et al. CCQM-P98: Improvement of quantitative analysis of Fe-Ni alloy films using a certified alloy reference film [J]. Metrologia,2009,46(1A): Technical supplement 08006.
[9]王海,程斌,宋小平,等.Fe-Ni合金薄膜组成准确测量的XPS研究 [J].稀有金属,2010,34(3):431-435.
[10]Briggs D, Grant J T. Surface Analysis by Auger and X-ray Photoelectron Spectroscopy [M]. Manchester: IM Publications and Surface Spectra Ltd,2003.
[11]Gross T, Lippitz A, Unger W, et al. Uncertainty in measure-ment of overlayer thickness of thermally oxidized silicon using x-ray photoelectron spectroscopy [J]. Surface and Interface Analysis,2000,29(12): 891-894. |
|
|
|