Nb/Al-AlOx/Nb约瑟夫森结薄膜沉积研究

doi:10.3969/j.issn.1000-1158.2023.05.14

Abstract
Figure/Table
References (23)
Related Citation (15)

Download: PDF (59550 KB) HTML (1 KB)
Export: BibTeX | EndNote (RIS)

Abstract Low temperature superconducting devices based on Nb/Al-AlOx/Nb Josephson junctions are widely used, one of the keys to fabricate high-quality S-I-S Josephson junctions is to deposit high-quality Nb/Al-AlOx/Nb trilayer. Many property parameters can influence the quality of trilayer, such as the residual resistance ratio(R.R.R),superconducting transition temperature (Tc),surface roughness,film stress, the thickness of aluminum(Al) film and so on. By analyzing the relationships of the parameters above with different sputtering conditions, the best deposition condition can be determined. Also, different critical current densities of Nb/Al-AlOx/Nb trilayer can be obtained by controlling the oxidation pressure and time of Al.

Key words： metrology Josephson junction Nb/Al-AlOx/Nb trilayer deposition DC magnetron sputtering oxidation process

Received: 18 October 2021 Published: 18 May 2023

PACS:

TB971

	Service

	E-mail this article
	Add to my bookshelf
	Add to citation manager
	E-mail Alert
	RSS
	Articles by authors
	GAO He
	WANG Shi-jian
	XU Da
	LI Jin-jin
	WANG Xue-shen
	ZHONG Qing

Cite this article:

GAO He,WANG Shi-jian,XU Da, et al. Study of the Deposition of Nb/Al-AlOx/Nb Josephson Junction Trilayer[J]. Acta Metrologica Sinica, 2023, 44(5): 765-770.

URL:

http://jlxb.china-csm.org:81/Jwk_jlxb/EN/10.3969/j.issn.1000-1158.2023.05.14 OR http://jlxb.china-csm.org:81/Jwk_jlxb/EN/Y2023/V44/I5/765

［1］	郭小玮, 迟宗涛, 曹文会, 等. 约瑟夫森结阵器件的研究进展［J］. 计量学报, 2013, 34(4): 378-382.
［2］	Brock D K. RSFQ Technology: Circuits and Systems ［J］. International Journal of High Speed Electronics and Systems, 2001, 11(1): 307-362.
［3］	Tsuboi M, Inatani J, Kasuga T, et al. A 40GHz band SIS receiver using Nb/AlAlOx/Nb array junctions ［J］. International Journal of Infrared & Millimeter Waves, 1987, 8(1): 1-11.
［5］	Barone A, Peluso G, Pepe G, et al. High quality Nb-based junctions for superconductive detectors ［J］. Nuclear Physics B-Proceedings Supplements, 1999, 32(3): 300-306.
［6］	Wang Z, Kawakami A, Uzawa Y, et al. High critical current density NbN/AlN/NbN tunnel junctions fabricated on ambient temperature MgO substrates ［J］. Applied Physics Letters, 1994, 64(15): 2034-2036.
［8］	Shinichi Morohashi, Shinoki F, Shoji A, et al. High quality Nb/Al-AlOx/Nb Josephson junction ［J］. Applied Physics Letters, 1985, 46(12): 1179-1181.
［10］	Li K, Mcdermott R, Vavilov M G. Hardware-Efficient Qubit Control with Single-Flux-Quantum Pulse Sequences ［J］. Physical Review Applied, 2019, 12(1): 014044.
［12］	Kaiser C, Meckbach J M, Ilin K S, et al. Aluminum Hard Mask Technique for the Fabrication of High-Quality Submicron Nb/Al-AlOx/Nb Josephson Junctions ［J］. Superconductor Science and Technology, 2010, 24(3): 61-66.
［13］	刘贤文, 徐骁龙, 李劲劲, 等. TES用超导薄膜制备及特性研究［J］. 计量学报, 2021, 42(2): 184-188.
	Guo X W, Chi Z T, Cao W H, et al. The Research Progress of the Josephson Array Device ［J］. Acta Metrologica Sinica, 2013, 34(4): 387-382.
［9］	Clarke J, Braginski A I. The SQUID Handbook: Fundamentals and Technology of SQUIDs and SQUID Systems, Volume I ［M］. Wiley-VCH, 2005.
［11］	Zacher R A, Saulnier G, Fritz G G, et al. Nb/Al/AlOx/Nb superconducting tunnel junctions as x-ray detectors ［J］. Journal of Low Temperature Physics, 1993, 93(3-4): 581-586.
［15］	Imamura T, Shiota T, Hasuo S. Fabrication of High Quality Nb/AlOx-Al/Nb Josephson Junctions: I-Sputtered Nb Films for Junction Electrodes ［J］. IEEE Transactions on Applied Superconductivity, 1992, 2(1): 1-14.
［17］	Imamura T, Hasuo S. Fabrication of high quality Nb/AlOx-Al/Nb Josephson junctions. II. Deposition of thin Al layers on Nb films ［J］. IEEE Transactions on Applied Superconductivity, 2019, 29(5): 1-5.
［18］	Wu Y, Ying L L, Li G Q, et al. Film Stress Influence on Nb/Al-AlOx/Nb Josephson Junctions ［J］. IEEE Transactions on Applied Superconductivity, 2019, 29(5): 1-5, 1102105.
［20］	Tolpygo S K, Cimpoiasu E, Liu X, et al. Tunneling properties of barriers in Nb/Al/AlOx/Nb junctions ［J］. IEEE Transactions on Applied Superconductivity, 2003, 13(2): 99-102.
［22］	Miller R E, Mallison W H, Kleinsasser A W, et al. Niobium trilayer Josephson tunnel junctions with ultrahigh critical current densities ［J］. Applied Physics Letters, 1998, 63(10): 1423-1425.
［4］	Schmelz M, Stolz R. Superconducting Quantum Interference Device (SQUID) Magnetometers ［J］. Springer International Publishing, 2017, 19: 279-311.
［7］	Berkley A J, Xu H, Gubrud M A, et al. Decoherence in a Josephson junction qubit ［J］. Physical Review B, 2003, 68(6): 060502.
	Liu X W, Xu X L, Li J J, et al. Deposition and Characterization of Thin Films for Superconducting Transition Edge Sensor ［J］. Acta Metrologica Sinica, 2021, 42(2): 184-188.
［16］	Lu R, Elliot A J, Wille L, et al. Fabrication of Nb/Al2O3/Nb Josephson Junctions using in situ Magnetron Sputtering and Atomic Layer Deposition ［J］. IEEE Transactions on Applied Superconductivity, 2013, 23(3): 1100705.
［23］	徐达, 钟青, 曹文会, 等. 二阶梯度交叉耦合超导量子干涉仪电流传感器研制［J］. 物理学报, 70(12): 128501.
［14］	Fleischmann A, Link M, Daniyarov T, et al. Metallic magnetic calorimeters (MMC): detectors for high resolution X-ray spectroscopy ［J］. Nuclear Instruments & Methods in Physics Research, 2004, 520(1/3): 27-31.
［19］	Kempf S, Ferring A, Fleischmann A, et al. Characterization of the reliability and uniformity of an anodization-free fabrication process for high-quality Nb/Al-AlOx/Nb Josephson junctions ［J］. Superconductor Science & Technology, 2013, 26(6): 065012.
［21］	Mallison W H, Miller R E, Kleinsasser A W. Effect of growth conditions on the electrical properties of Nb/Al-oxide/Nb tunnel junctions ［J］. IEEE Transactions on Applied Superconductivity, 1995, 5(2): 2330-2333.
	Xu D, ZhongZ Q, Cao W H, et al. A second-order gradiometric superconducting quantum interference device current sensor with cross-coupled structure ［J］. Acta Physica Sinica, 2021, 70(12): 128501.