Acta Metrologica Sinica  2022, Vol. 43 Issue (4): 464-469    DOI: 10.3969/j.issn.1000-1158.2022.04.05
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Reproducible and Accurate Fabrication of High Gain Raman Gold Plated Tips Based on FDTD Simulation
ZHU Min-hao1,GAO Si-tian2,HUANG Lu2,HU Jia-cheng1,SUN Xiao-shuang2,LIU Lin-wei2
1. Collage of Metrology & Measurement Engineering, China Jiliang University, Hangzhou, Zhejiang 310018, China
2. National Institute of Metrology, Beijing 100029, China
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Abstract  A high gain Raman tip suitable for tip enhanced Raman system (TERS) based on finite difference time domain (FDTD) simulation and its preparation methods are put forward. The near-field electric field distribution of the concave tungsten tip with gold plating thickness of (5~100)nm and with intermediate transition layer materials of 5nm concluding SiO2, Ta2O5, Ti, Cu is simulated and analyzed at the gold hemispherical sample on the gold substrate. The simulation results show that the tip with a gold plating thickness of 50nm and intermediate interlayer of Ti and Cu have the strongest enhancement effect. On this basis, the designed high-gain tip was successfully prepared by magnetron sputtering and the titanium plating time was set at 7s and 120s for gold plating. The tip was cut by focusing ion beam (FIB) and the profile structure of the tip was observed by a scanning electron microscope (SEM), and the size and shape of the coated tip were verified to meet the design requirements. After 4 batches of 20 needles in each batch, repeated coating experiments were carried out, which proved that the designed needles were stable and could be prepared repeatedly.
Key wordsmetrology      TERS      FDTD      gold-plated      tungsten tip     
Received: 14 January 2021      Published: 08 April 2022
PACS:  TB92  
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ZHU Min-hao
GAO Si-tian
HUANG Lu
HU Jia-cheng
SUN Xiao-shuang
LIU Lin-wei
Cite this article:   
ZHU Min-hao,GAO Si-tian,HUANG Lu, et al. Reproducible and Accurate Fabrication of High Gain Raman Gold Plated Tips Based on FDTD Simulation[J]. Acta Metrologica Sinica, 2022, 43(4): 464-469.
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http://jlxb.china-csm.org:81/Jwk_jlxb/EN/10.3969/j.issn.1000-1158.2022.04.05      OR     http://jlxb.china-csm.org:81/Jwk_jlxb/EN/Y2022/V43/I4/464
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