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Error Measurement and Modeling Compensation of Three Axis Perpendicularity of Micro-nano CMM |
LI Rui-jun,LI Jie,HE Ya-xiong,CHENG Zhen-ying,HUANG Qiang-xian |
Anhui Province Key Laboratory of Measuring Theory and Precision Instrument, School of Instrument Science and Opto-electronics Engineering, Hefei University of Technology, Hefei, Anhui 230009, China |
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Abstract The perpendicularity error is one of an important error sources of micro-nano coordinate measuring machines (CMMs). This error should be measured with high accuracy and compensated by an effective model. The measurement setup based on PSD was used to measure the straightness errors which can be transformed into the perpendicularity errors of the micro-nano CMM. A model for perpendicularity errors of the micro-nano CMM was built and used to compensate the errors. Several 0-class gauge blocks were measured and the measuring errors in X and Y directions of the blocks were reduced by 11μm and 5μm respectively after the compensation. The correctness of the perpendicularity error measuring method and the effectiveness of the compensation model were validated.
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Received: 22 April 2021
Published: 08 April 2022
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