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| Research on Fractal Characterization of the Surface Morphology of Cu/Ti Nano Thin Film |
| LIN Qi-jing1,2,3,4,WU Hao2,ZHANG Fu-zheng2,WANG Chen-ying1,2,JIANG Zhuang-de1,2 |
1. Collaborative Innovation Center of High-End Manufacturing Equipment, Xian Jiaotong University, Xian, Shaanxi 710054, China
2. State Key Laboratory of Mechanical Manufacturing Systems Engineering, Xian Jiaotong University,Xian, Shaanxi 710049, China
3. State Key Laboratory of Digital Manufacturing Equipment & Technology,Huazhong University of Science and Technology, Wuhan, Hubei 430074, China
4. State Key Laboratory of Fluid Power and Mechatronic Systems, Zhejiang University, Hangzhou, Zhejiang 310027, China |
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Abstract Different composition and thickness of Cu/Ti films are fabricated by magnetron sputtering technology and their surface morphology are measured using atomic force microscope (AFM). The method of power spectrum is used to characterize the fractal morphology of the AFM height images. The results show that the Cu/Ti film surface morphology has multi-scale behavior and surface evolution in the whole and local area presents different scaling behavior. The high frequency section of the power spectrum for AFM image directly reflects the detail information of the surface while low frequency section reflects the complexity of the background region. There is an inevitable correlation between low frequency fractal dimension and roughness, because the change of low frequency fractal dimension can reflect the change trend of rough value Ra.
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Received: 09 August 2017
Published: 05 September 2018
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2018, Vol. 39 
