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| Traceability Experiments on 10GΩ On-wafer High Resistance |
| LIU Yan,QIAO Yu-e,DING Chen,LIANG Fa-guo |
| The 13th Research Institute, CETC, Shijiazhuang, Hebei 050051, China |
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Abstract A modified on-wafer high resistance measuring system, along with customized trace-back method, is developed to fulfill the traceability requirements. On-wafer high resistance is successfully traced back to a standard resistor with the system. The system is equipped with extra probes and leads in order to extend the ports of the resistor standard to the tips of the probes and on-wafer thru lines are used to short the corresponding probes. Thus a circuit taking a Lead-On-wafer-Lead form is build to connect on-wafer measurement with a resistor standard. A conservative method is given to evaluate the uncertainty of the proposed system. Experiments on traceability are taken, and the uncertainty of the system achieved 0.3%(k=2) at 10 GΩ.
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Received: 08 September 2016
Published: 06 July 2018
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2018, Vol. 39 
