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Analysis of the Measurement Comparison Results of On-wafer S-parameters |
LIU Chen1,GAO Ling1,LUAN Peng1,CHEN Ting2,HUANG Yinglong3,LI Yankui4,JIN Cheng5,ZOU Xiyue6,LU Jing7,CHEN Keyuan8 |
1.The 13th Research Institute of China Electronics Technology Group Corporation, Shijiazhuang, Hebei 050051,China
2. Beijing Institute of Radio Metrology and Measurement, Beijing 100029, China
3. China Institute of Electronic Technology Standardization, Beijing 100176, China
4. Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
5. The 14th Research Institute of China Electronics Technology Group Corporation,Nanjing, Jiangsu 210013, China
6. Hunan Shibian Communication Technology Co., Ltd., Xiangtan, Hunan 411104, China
7. Huameibo Technology (Beijing) Co., Ltd., Beijing 100097, China
8. Hebei Xiongan Taixin Electronic Technology Co., Ltd., Baoding, Hebei 071799, China |
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Abstract As the leading laboratory, the 13th Research Institute of China Electronics Technology Group Corporation carried out the measurement comparison of on-wafer S-parameters, summarized and analyzed the measurement results of on-wafer S-parameters submitted by the joined laboratories, and evaluated the measurement results of each laboratory with En. Through the measurement comparison of the on-wafer S-parameters, the accuracy and reliability of the transmission of the quantities are ensured, especially the main sources of the measurement uncertainty of the on-chip S-parameters are unified. At the same time, it also provides the industry with a comparison platform for the consistency of on-chip S-parameter measurement.
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Received: 23 January 2024
Published: 26 September 2024
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