Acta Metrologica Sinica  2023, Vol. 44 Issue (6): 962-967    DOI: 10.3969/j.issn.1000-1158.2023.06.18
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Research on Overall Calibration Method of PCM Equipment Capacitance Parameters
QIAO Yu-e,LIU Xia-mei,DING Chen,ZHU Chao,WU Ai-hua
The 13th Research Institute of China Electronics Technology Group Corporation, Shijiazhuang, Hebei 050051, China
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Abstract  Process control monitor (PCM equipment) is widely used in the semiconductor industry. It is necessary in the intermediate test of chip products. The accurate measurement of capacitance parameters of PCM equipment is an important mean to ensure the process parameters related to capacitance manufacturing. Since there is no traceability for the capacitance parameters of domestic PCM equipment at present, after the characteristics of the capacitance parameters test process of PCM equipment has been analyzed, a nondestructive calibration method based on on-wafer capacitor standards is studied. The on-wafer capacitor standards with a value low to 0.5pF is developed by using semiconductor single chip process and the maximum frequency is 1MHz, which meets the requirements of the whole automatic calibration of the capacitance parameters of the domestic equipment. The measurement uncertainty is better than 1%, and the stability is better than 0.2%. The traceability method from capacitor parameter of PCM equipment to the highest national/national defense standards, so as to ensure the accuracy and consistency of the measurement results of PCM graphic capacitance of chip products, and improve the periodic inspection efficiency.
Key wordsmetrology      on-wafer capacitor standards      PCM      whole-calibration      calibration device      traceability     
Received: 26 September 2021      Published: 25 June 2023
PACS:  TB973  
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QIAO Yu-e
LIU Xia-mei
DING Chen
ZHU Chao
WU Ai-hua
Cite this article:   
QIAO Yu-e,LIU Xia-mei,DING Chen, et al. Research on Overall Calibration Method of PCM Equipment Capacitance Parameters[J]. Acta Metrologica Sinica, 2023, 44(6): 962-967.
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http://jlxb.china-csm.org:81/Jwk_jlxb/EN/10.3969/j.issn.1000-1158.2023.06.18     OR     http://jlxb.china-csm.org:81/Jwk_jlxb/EN/Y2023/V44/I6/962
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