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| Effect of Surface and Sub-surface Characteristics on the Contrast of Multilayer Film Grating Imaging |
| ZHANG Long-fei1,2,WANG Xing-rui1,2,DENG Xiao2,3,CHENG Xin-bin1,2 |
1. School of Physical Science and Engineering, Tongji University, Shanghai 200092, China
2. Institute of Precision Optical Engineering, Tongji University, Shanghai 200092, China
3. School of Aerospace Engineering and Applied Mechanics, Tongji University, Shanghai 200092, China
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Abstract Based on the Si/SiO2 material, a multilayer film grating with nominal pitch of 50 nm is prepared. The problem of sub -surface damage during the grinding and polishing process and wet etching uniformity is analyzed emphatically. The cross-sectional roughness and the results of the etching grating are measured and analyzed by atomic force microscopy (AFM) and transmission electron microscopy (TEM). The results show that the decrease of the cross-sectional roughness and the uniformity of the etching in the preparation of the multilayer film grating helps to obtain a uniform high-contrast contrast multi-layer raster image for TEM measurement.
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Received: 23 May 2017
Published: 12 April 2018
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2018, Vol. 39 
