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| Research on Tungsten Probe Fabrication Device Based on the Electrochemical Etching Method |
| XU Jing-tao1,GAO Si-tian2,HUANG Lu2,LI Qi2,LI Dong-sheng1,WANG Ya-li3 |
1. Collage of Metrology & Measurement Engineering, China Jiliang University, Hangzhou, Zhejiang 310018, China
2. National Institute of Metrology, Beijing 100029, China
3. Collage of Mechanical Engineering and Automation, Zhejiang Sci-Tech University, Hangzhou, Zhejiang 310027, China |
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Abstract A tungsten probe fabrication device is proposed based on electrochemical etching method and the parameter of fabricating tungsten probe is researched.The experimental part can be used to adjust the relative position and motion parameters of the probe and the electrolyzer.The control part can be used to control and record the state of electrochemical etching.Compared with traditional fabrication device, the present device ensured to fabricate large length-to-width ratio tip by controlling the motion of tungsten probe, meanwhile, the radius of tips can be precisely controlled within 5 ~ 20 nm by controlling the etching time.
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Received: 26 May 2017
Published: 12 April 2018
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Corresponding Authors:
GAO Si-tian
E-mail: gaost@nim.ac.cn
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2018, Vol. 39 
