|
|
|
| Analysis and Evaluation of AFM Uncertainty in Linewidth Measurement |
| HAN Guo-qiang1,2,3,CHEN Yu-qin1 |
1.School of Mechanical Engineering and Automatic, Fuzhou University, Fuzhou, Fujian 350108, China
2.State Key Laboratory for Manufacturing System Engineering, Xian Jiaotong University, Xi‘an, Shanxi Xi’an 710049, China
3.School of Physics and Information Engineering, Fuzhou University, Fuzhou, Fujian 350108, China |
|
|
|
|
Abstract The sources of linewidth measurement uncertainty of AFM type P47 are analyzed in details.A new model based on geometry shape of linewidth measurement is proposed.An uncertainty evaluation method is offered according to systematic analysis results in linewidth measurement.The measurement uncertainty component caused by traditional Si3N4AFM tip is about 5% of the total linewidth.Finally,the main measurement uncertainty source- AFM tip is determined.
|
|
|
|
|
|
|
|
［1］The Semiconductor Industry Association.International Roadmap for Semiconductors(ITRS)［EB］.http://www.itrs.net/Links/2007ITRS/2007_Chapters/2007_Metrology.pdf,2007
［2］Misumi I, G onda, Kurosawa T, et al. Uncertainty in pitch measurements of one-dimensional grating standards using a nanometrological atomic force microscopy［J］.Measurement Science and Technology,2003,14(4):463-471.
［3］褚魏,赵学增,王凌,等.使用AFM测量纳米尺度线宽的不确定度分析［J］.计量学报,2005,26(2):6-10.
［4］朱明智,蒋庄德,景蔚萱.原子力显微镜探针原位有效参数对线宽测量的修正［J］.计量学报,2005,26(3):204-206,252.
［5］韩国强,景蔚萱,蒋庄德,等.利用Si（100）典型微结构对原子力显微镜探针参数进行表征［J］.计量学报, 2010, 5(31):426-429.
［6］International Organization for Standardization,Guide to the expression of uncertainty in measurement［S］.1995.
［7］Taylor B N, Kuyatt C E. Guidelines for evaluating and expressing the uncertainty of NIST measurment results［EB］. http://www.nist.gov/physlab/pubs/tn1297/,1994
［8］Zhang H, Huang F, Higuchi T. Dual unit scanning tunneling microscope atomic force microscopy for length measurement based on reference scales［J］.Journal of Vacuum Science and Technology B, 1997,15(4)780-784.
［9］Yurov V Y, Klimov A N. Scanning tunneling microscope calibration and reconstruction of real image-drift and slope elimination［J］.Review of Scientific Instruments, 1994,65(5):1551-1557.
［10］Mativetsky J M, Burke S A,Hoffmann R, et al. Molecular resolution imaging of C-60 on Au(111) by non-contact atomic force microscopy［J］. Nanotechnology, 2004, 15(2):40-43.
［11］Lapshin R V, Rostislav V. Automatic drift elimination in probe microscope images based on techniques of counter-scanning and topography feature recognition［J］.Measurement Science and Technology, 2007, 18(3):907-927. |
|
|
|
2012, Vol. 33 
