1. Xiamen Institute of Measurement and Testing, Xiamen, Fujian 361004, China
2. Pen-Tung Sah Institute of Micro-Nano Science and Technology, Xiamen University, Xiamen, Fujian 361102, China
3. CMEC Group Renewable Energy Development Co., Ltd., Beijing 100055, China
Abstract：Compensation for rotational axis error in semiconductor wafer calibrators is crucial for enhancing positioning accuracy.This study presents a compensation method based on a single sensor for the rotational axis error of wafer calibrators.This approach effectively avoids introducing new errors and multiple calibration issues associated with using additional sensors or equipment.The method employs a dual filtering technique that combines ensemble averaging with wavelet threshold denoising to reduce random noise in the collected signals.Additionally, a statistical error separation method is utilized to accurately isolate roundness errors embedded in high signal-to-noise ratio measurements.By employing a multi-step approach, the method calculates precise rotational errors and utilizes the derived error data to correct the circumferential data of the wafer detected by the sensor, thus achieving compensation.Experimental results indicate that the calibration deviation in the positioning of the wafer calibrator is approximately 0.02 mm, demonstrating an improvement in calibration accuracy and validating the effectiveness of the proposed method.
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2024, Vol. 45 
