[1]许晓青, 李锁印, 冯亚南, 等. 微纳尺寸台阶高度样块的质量参数评价[J]. 计测技术, 2016, 36(S1): 29-32.
XU X Q, LI S Y, FENG Y N, et al. Quality parameter evaluation of micro-nano sized step height samples[J]Metrology & Measurement Technology, 2016, 36(S1): 29-32.
[2]VLSI. Ultra Thick Step Height Standards[S]. https://www.vlsistandards.com/products/dimensional/ultrathickshs.asp?SID=107.[2023-08-29].
[3]VLSI. Step Height Standards (Quartz)[S]. https://www.vlsistandards.com/products/dimensional/step.asp?SID=100.[2023-08-29].
[4]张雅馨, 王琛英, 景蔚萱, 等. 亚50nm台阶高度标准物质的可控制备及定值研究[J]. 仪器仪表学报, 2022, 43(11): 86-93.
ZHANG Y X, WANG C Y, JING W X, et al. Study on the controllable fabrication and calibration of sub-50 nm step height reference materials[J]. Chinese Journal of Scientific Instrument, 2022, 43(11): 86-93.
[5]徐毅, 高思田, 李晶. 纳米、亚微米标准样板及SPM量值溯源[J]. 计量学报, 2003,24(2): 81-84.
XU Y, GAO S T, LI J. Nanometer and Sub-micrometer Standard Samples and Valuation Traceability for SPM[J]. Acta Metrologica Sinica, 2003,24(2): 81-84.
[6]冯亚南, 李锁印, 韩志国, 等. 微米级台阶高度样块制备中刻蚀工艺的选择[J]. 微纳电子技术, 2016, 53(11): 773-778.
FENG Y N, LI S Y, HAN Z G, et al. Selection of the Etching Processes for the fabrication of the Micro Step Height Specimens[J]. Micronanoelectronic Technology, 2016, 53(11): 773-778.
[7]吴小桐, 王生怀, 钟毓宁, 等. 台阶高度评定算法的适应性研究[J]. 湖北汽车工业学院学报, 2018, 32(3): 32-36.
WU X T, WANG S H, ZHONG Y N, et al. Applicability Analysis of Step Height Evaluation Algorithm[J]. Journal of Hubei University of Automotive Technology, 2018, 32(3): 32-36.
[8]胡凯, 蒋向前, 刘晓军. 台阶高度的评定方法[J]. 中国仪器仪表, 2009(10): 69-72.
HU K, JIANG X Q, LIU X J. Evaluation Method of Step Height[J]. China Instrumentation, 2009(10): 69-72.
[9]FU J, TSAI V, KONING R, et al. Algorithms for calculating single-atom step heights[J]. Nanotechnology, 1999, 10(4): 428.
[10]BENNETT J M. Comparison of instruments for measuring step heights and surface profiles[J]. Applied Optics, 1985, 24(22): 3766.
[11]Geometrical Product Specifications (GPS)-Surface texture: Profile method; Measurement standards:ISO 5436-1[S]. 2000.
[12]KOENING R G J, DIXSON R G, FU J, et al. Step-height metrology for data storage applications[C]// Conference on Recent Advances in Metrology, Characterization, and Standards for Optical Digital Data Disks. DENVER, CO, United States,1999.
[13]YANG S, LI C, WANG C, et al. A sub-50nm three-step height sample for AFM calibration[J]. Measurement Science & Technology, 2014, 25(12): 125004-125011.
[14]刘俭, 谷康, 李梦周, 等. 光学显微三维测量解耦合准则[J]. 红外与激光工程, 2017, 46(3): 8-14.
LIU J, GU K, LI M Z, et al. 3D measurement decoupling criterion in optical microscopy[J]. Infrared and Laser Engineering, 2017, 46(3): 8-14.
[15]LIU J, LI M, LI Q, et al. Decoupling criterion based on limited energy loss condition for groove measurement using optical scanning microscopes[J]. Measurement Science & Technology, 2016, 27(12): 125014.
[16]余茜茜, 施玉书, 张树, 等. 微纳米台阶高度评定方法的比较与分析[J]. 计量技术, 2020(8): 29-33.
[17]陈海军, 魏宏杰. 干法刻蚀工艺与设备[J]. 设备管理与维修, 2020(13): 137-139.
CHEN H J, WEI H J. Dry Etching Process and Equipment[J]. Plant Maintenance Engineering, 2020(13): 137-139.
[18]程壹涛, 刘成群, 吴海. 离子束刻蚀技术与设备常见故障分析[J]. 电子工业专用设备, 2021, 50(5): 33-38.
CHENG Y T, LIU C Q, WU H. Ion Beam Etching Technology and Analysis of Common Failures of the Equipment[J]. Equipment for Electronic Products Manufacturing, 2021, 50(5): 33-38.