2~10μm台阶高度标准物质候选物的研制和质量评价

柳迪,王琛英,张雅馨,王云祥,王松,陈伦涛,王永录,朱楠,蒋庄德

计量学报 ›› 2024, Vol. 45 ›› Issue (3) : 305-310.

PDF(499 KB)
PDF(499 KB)
计量学报 ›› 2024, Vol. 45 ›› Issue (3) : 305-310. DOI: 10.3969/j.issn.1000-1158.2024.03.01
几何量计量

2~10μm台阶高度标准物质候选物的研制和质量评价

  • 柳迪1,3,王琛英2,3,张雅馨1,3,王云祥4,王松1,3,陈伦涛1,3,王永录3,朱楠3,蒋庄德1,3
作者信息 +

Fabrication and Quality Evaluation of 2~10μm Step Height Reference Material Candidates

  • LIU Di1,3,WANG Chenying2,3,ZHANG Yaxin1,3,WANG Yunxiang4,WANG Song1,3,CHEN Luntao1,3,WANG Yonglu3,ZHU Nan3,JIANG Zhuangde1,3
Author information +
文章历史 +

摘要

微米台阶高度标准物质用于校准仪器z轴性能,传递准确的微米高度量值。利用光刻结合干法刻蚀工艺实现公称高度为2,5,10μm台阶高度标准物质候选物的制备,并对台阶高度、粗糙度和上下表面平行度进行表征。使用激光共聚焦显微镜和非球面测量仪进行测量,基于双边算法、直方图法、ISO算法和光学显微解耦合准则(LEL)法对台阶高度进行评定,对于同一标准物质候选物各评定方法间的标准差均不超过0.024μm,台阶高度评定值的相对偏差均在5%以内,表明不同算法的评定结果一致性水平较高且量值可靠;不同仪器的评定结果对比,说明了评定方法之间也具有良好的一致性;同时,粗糙度不超过0.04μm,上下表面平行度不超过0.03°,验证了标准物质候选物制备效果良好。

Abstract

The micrometer step height reference materials can used to calibrate the z-axis performance of the instrument and transmit accurate micrometer height values. The step height reference material candidates with 2,5,10μm nominal size are prepared by photolithography combined with dry etching. The height, roughness, and parallelism of the steps are characterized. Using a laser confocal microscope and an aspheric measuring instrument for measurement, the step height is evaluated based on the bilateral algorithm, histogram method, International Organization for Standardization (ISO algorithm, and the decoupling criterion for optical microscopy (LEL) method. For the same reference material candidates, the standard deviation between each evaluation method does not exceed 0.024μm. Moreover, the relative deviation of the step height evaluation values is within 5%. This indicates that the evaluation results obtained using different algorithms and instruments have a high level of consistency and reliable measurement values. The comparison of evaluation results from different instruments indicates that the evaluation methods also have good consistency. Meanwhile, the roughness does not exceed 0.04μm. The parallelism of the upper and lower surfaces does not exceed 0.03°, which verifies the good preparation effect of the reference material candidates.

关键词

微米计量 / 台阶高度标准物质 / 干法刻蚀 / 粗糙度 / 平行度

Key words

micron metrology / step height reference material / dry etching / roughness / parallelism

引用本文

导出引用
柳迪,王琛英,张雅馨,王云祥,王松,陈伦涛,王永录,朱楠,蒋庄德. 2~10μm台阶高度标准物质候选物的研制和质量评价[J]. 计量学报. 2024, 45(3): 305-310 https://doi.org/10.3969/j.issn.1000-1158.2024.03.01
LIU Di,WANG Chenying,ZHANG Yaxin,WANG Yunxiang,WANG Song,CHEN Luntao,WANG Yonglu,ZHU Nan,JIANG Zhuangde. Fabrication and Quality Evaluation of 2~10μm Step Height Reference Material Candidates[J]. Acta Metrologica Sinica. 2024, 45(3): 305-310 https://doi.org/10.3969/j.issn.1000-1158.2024.03.01
中图分类号: TB92   

参考文献

[1]许晓青, 李锁印, 冯亚南, 等. 微纳尺寸台阶高度样块的质量参数评价[J]. 计测技术, 2016, 36(S1): 29-32.
XU X Q, LI S Y, FENG Y N, et al. Quality parameter evaluation of micro-nano sized step height samples[J]Metrology & Measurement Technology, 2016, 36(S1): 29-32.
[2]VLSI. Ultra Thick Step Height Standards[S].  https://www.vlsistandards.com/products/dimensional/ultrathickshs.asp?SID=107.[2023-08-29].
[3]VLSI. Step Height Standards (Quartz)[S]. https://www.vlsistandards.com/products/dimensional/step.asp?SID=100.[2023-08-29].
[4]张雅馨, 王琛英, 景蔚萱, 等. 亚50nm台阶高度标准物质的可控制备及定值研究[J]. 仪器仪表学报, 2022, 43(11): 86-93.
ZHANG Y X, WANG C Y, JING W X, et al. Study on the controllable fabrication and calibration of sub-50 nm step height reference materials[J]. Chinese Journal of Scientific Instrument, 2022, 43(11): 86-93.
[5]徐毅, 高思田, 李晶. 纳米、亚微米标准样板及SPM量值溯源[J]. 计量学报, 2003,24(2): 81-84.
XU Y, GAO S T, LI J. Nanometer and Sub-micrometer Standard Samples and Valuation Traceability for SPM[J]. Acta Metrologica Sinica, 2003,24(2): 81-84.
[6]冯亚南, 李锁印, 韩志国, 等. 微米级台阶高度样块制备中刻蚀工艺的选择[J]. 微纳电子技术, 2016, 53(11): 773-778.
FENG Y N, LI S Y, HAN Z G, et al. Selection of the Etching Processes for the fabrication of the Micro Step Height Specimens[J]. Micronanoelectronic Technology, 2016, 53(11): 773-778.
[7]吴小桐, 王生怀, 钟毓宁, 等. 台阶高度评定算法的适应性研究[J]. 湖北汽车工业学院学报, 2018, 32(3): 32-36.
WU X T, WANG S H, ZHONG Y N, et al. Applicability Analysis of Step Height Evaluation Algorithm[J]. Journal of Hubei University of Automotive Technology, 2018, 32(3): 32-36.
[8]胡凯, 蒋向前, 刘晓军. 台阶高度的评定方法[J]. 中国仪器仪表, 2009(10): 69-72.
HU K, JIANG X Q, LIU X J. Evaluation Method of Step Height[J]. China Instrumentation, 2009(10): 69-72.
[9]FU J, TSAI V, KONING R, et al. Algorithms for calculating single-atom step heights[J]. Nanotechnology, 1999, 10(4): 428.
[10]BENNETT J M. Comparison of instruments for measuring step heights and surface profiles[J]. Applied Optics, 1985, 24(22): 3766.
[11]Geometrical Product Specifications (GPS)-Surface texture: Profile method; Measurement standards:ISO 5436-1[S].  2000.
[12]KOENING R G J, DIXSON R G, FU J, et al. Step-height metrology for data storage applications[C]// Conference on Recent Advances in Metrology, Characterization, and Standards for Optical Digital Data Disks. DENVER, CO, United States,1999.
[13]YANG S, LI C, WANG C, et al. A sub-50nm three-step height sample for AFM calibration[J]. Measurement Science & Technology, 2014, 25(12): 125004-125011.
[14]刘俭, 谷康, 李梦周, 等. 光学显微三维测量解耦合准则[J]. 红外与激光工程, 2017, 46(3): 8-14.
LIU J, GU K, LI M Z, et al. 3D measurement decoupling criterion in optical microscopy[J]. Infrared and Laser Engineering, 2017, 46(3): 8-14.
[15]LIU J, LI M, LI Q, et al. Decoupling criterion based on limited energy loss condition for groove measurement using optical scanning microscopes[J]. Measurement Science & Technology, 2016, 27(12): 125014.
[16]余茜茜, 施玉书, 张树, 等. 微纳米台阶高度评定方法的比较与分析[J]. 计量技术, 2020(8): 29-33.
[17]陈海军, 魏宏杰. 干法刻蚀工艺与设备[J]. 设备管理与维修, 2020(13): 137-139.
CHEN H J, WEI H J. Dry Etching Process and Equipment[J]. Plant Maintenance Engineering, 2020(13): 137-139.
[18]程壹涛, 刘成群, 吴海. 离子束刻蚀技术与设备常见故障分析[J]. 电子工业专用设备, 2021, 50(5): 33-38.
CHENG Y T, LIU C Q, WU H. Ion Beam Etching Technology and Analysis of Common Failures of the Equipment[J]. Equipment for Electronic Products Manufacturing, 2021, 50(5): 33-38.

基金

国家自然科学基金(52175354)

PDF(499 KB)

Accesses

Citation

Detail

段落导航
相关文章

/