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计量学报  2023, Vol. 44 Issue (6): 962-967    DOI: 10.3969/j.issn.1000-1158.2023.06.18
  无线电、时间频率计量 本期目录 | 过刊浏览 | 高级检索 |
PCM设备电容参数整体校准方法研究
乔玉娥,刘霞美,丁晨,朱超,吴爱华
中国电子科技集团公司第十三研究所,河北 石家庄 050051
Research on Overall Calibration Method of PCM Equipment Capacitance Parameters
QIAO Yu-e,LIU Xia-mei,DING Chen,ZHU Chao,WU Ai-hua
The 13th Research Institute of China Electronics Technology Group Corporation, Shijiazhuang, Hebei 050051, China
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摘要 半导体行业中普遍使用的工艺过程监控设备(PCM设备),是芯片产品中测环节必不可少的测量设备。PCM设备电容参数的准确测量,是保证与电容制作相关工艺参数的重要手段。针对国内PCM设备电容参数暂无溯源途径现状,根据其测试原理,研究了基于在片电容标准件的整体无损校准方法。采用增加绝缘层的半导体工艺,研制了高稳定性、频响至1MHz、电容低至0.5pF的在片电容标准件,满足了国内PCM设备电容参数自动校准需求,测量不确定度优于1%。研究了PCM设备电容参数溯源方法,从而保证了芯片产品PCM图形电容量值测量结果的准确一致,提高了计量效率。
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乔玉娥
刘霞美
丁晨
朱超
吴爱华
关键词 计量学在片电容标准件工艺过程监控设备整体校准定标装置溯源    
Abstract:Process control monitor (PCM equipment) is widely used in the semiconductor industry. It is necessary in the intermediate test of chip products. The accurate measurement of capacitance parameters of PCM equipment is an important mean to ensure the process parameters related to capacitance manufacturing. Since there is no traceability for the capacitance parameters of domestic PCM equipment at present, after the characteristics of the capacitance parameters test process of PCM equipment has been analyzed, a nondestructive calibration method based on on-wafer capacitor standards is studied. The on-wafer capacitor standards with a value low to 0.5pF is developed by using semiconductor single chip process and the maximum frequency is 1MHz, which meets the requirements of the whole automatic calibration of the capacitance parameters of the domestic equipment. The measurement uncertainty is better than 1%, and the stability is better than 0.2%. The traceability method from capacitor parameter of PCM equipment to the highest national/national defense standards, so as to ensure the accuracy and consistency of the measurement results of PCM graphic capacitance of chip products, and improve the periodic inspection efficiency.
Key wordsmetrology    on-wafer capacitor standards    PCM    whole-calibration    calibration device    traceability
收稿日期: 2021-09-26      发布日期: 2023-06-25
PACS:  TB973  
通讯作者: 吴爱华(1980-),男,河北张家口人,中国电子科技集团公司第十三研究所计量维修部高工(研究员级),主要从事无线电计量方面的研究。Email:aihua.wu@139.com     E-mail: aihua.wu@139.com
作者简介: 乔玉娥(1980-),女,河北石家庄人,中国电子科技集团公司第十三研究所高工,主要从事电磁计量、在片电学参数测试方面的研究。Email: 13673237960@126.com
引用本文:   
乔玉娥,刘霞美,丁晨,朱超,吴爱华. PCM设备电容参数整体校准方法研究[J]. 计量学报, 2023, 44(6): 962-967.
QIAO Yu-e,LIU Xia-mei,DING Chen,ZHU Chao,WU Ai-hua. Research on Overall Calibration Method of PCM Equipment Capacitance Parameters. Acta Metrologica Sinica, 2023, 44(6): 962-967.
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