2025年04月27日 星期日 首页   |    期刊介绍   |    编 委 会   |    投稿指南   |    期刊订阅   |    统合信息   |    联系我们
计量学报  2023, Vol. 44 Issue (5): 671-678    DOI: 10.3969/j.issn.1000-1158.2023.05.01
  几何量计量 本期目录 | 过刊浏览 | 高级检索 |
基于Cr原子光刻技术的nm光栅间距比对测量定值方法研究
陈凯晴1,2,4,管钰晴2,4,邹文哲2,4,邓晓3,孔明1,陈雅晴1,2,4,熊英凡3,傅云霞1,2,4,雷李华1,2,4
1.中国计量大学计量测试工程学院,浙江 杭州 310018
2.上海市计量测试技术研究院,上海 201203
3.同济大学物理科学与工程学院,上海 200092
4.上海市在线检测与控制技术重点实验室,上海 201203
Research on the Method of Nanometer Grating Spacing Comparison Measurement Based on Cr Atomic Lithography Technology
CHEN Kai-qing1,2,4,GUAN Yu-qing2,4,ZOU Wen-zhe2,4,DENG Xiao3,KONG Ming1,CHEN Ya-qing1,2,4,XIONG Ying-fan3,FU Yun-xia1,2,4,LEI Li-hua1,2,4
1. College of Metrology & Measurement Engineering, China Jiliang University, Hangzhou,Zhejiang 310018, China
2. Shanghai Institute of Measurement and Testing Technology, Shanghai 201203, China
3. School of Physical Science and Engineering, Tongji University, Shanghai 200092
4. Shanghai Key Laboratory of Online Test and Control Technology, Shanghai 201203, China
全文: PDF (47170 KB)   HTML (1 KB) 
输出: BibTeX | EndNote (RIS)      
摘要 建立了一种基于Cr原子光刻技术的nm光栅间距比对测量定值方法。以国家自溯源光栅标准物质来建立标准样板校准溯源体系的可行性为基础,保障测量仪器(如原子力显微镜(AFM)、扫描电子显微镜(SEM)等)更高精度、可溯源性;设计并制备了节距长度有序递增的多周期电子束直写光栅样板,满足可适配于不同分辨率的nm测量仪器的需求,名义节距值分别为200、400、600、800、1000nm。经国家自溯源光栅标准物质比对后的AFM完成对nm栅格标准样板的测量与表征,实验表明:电子束直写制备的光栅标准样板均匀性水平1nm,相对不确定度低于2%,光栅均具有良好的均匀性、准确性以及稳定性,验证了研制的光栅标准样板能作为一种理想的实物标准运用于nm几何量量值溯源体系。
服务
把本文推荐给朋友
加入我的书架
加入引用管理器
E-mail Alert
RSS
作者相关文章
陈凯晴
管钰晴
邹文哲
邓晓
孔明
陈雅晴
熊英凡
傅云霞
雷李华
关键词 计量学Cr原子光刻技术比对定值光栅标准物质自溯源扁平化AFM    
Abstract:A method of nanometer grating spacing comparison measurement based on Cr atomic lithography technology is established. Based on the feasibility of establishing a calibration traceability system for standard templates based on national self-traceable grating reference materials, it ensures higher precision and traceability of measuring instruments . Precision nanometer measuring instruments that can be adapted to different resolutions, sequentially increasing multi-period electron beam direct writing grating template was designed and fabricated, the nominal pitch values are 200, 400, 600, 800, 1000nm. After the national self-traceable grating reference material comparison, AFM completed the measurement and characterization of the nano-grid standard sample. The experiment shows that the uniformity level of the grating standard sample prepared by electron beam direct writing is less than 1nm, and the uncertainty is less than 2%. The gratings have good uniformity, accuracy and stability, which verifies that the developed grating standard template can be used as an ideal physical standard in the traceability system of nano-geometric quantities. A method of nanometer grating spacing comparison measurement based on Cr atomic lithography technology is established. Based on the feasibility of establishing a calibration traceability system for standard templates based on national self-traceable grating reference materials, it ensures higher precision and traceability of measuring instruments (AFM, SEM, etc.); In order to meet the needs of high-precision nanometer measuring instruments that can be adapted to different resolutions, sequentially increasing multi-period electron beam direct writing grating template was designed and fabricated, the nominal pitch values are 200nm, 400nm, 600nm, 800nm, 1000nm. After the national self-traceable grating reference material comparison, AFM completed the measurement and characterization of the nano-grid standard sample. The experiment shows that the uniformity level of the grating standard sample prepared by electron beam direct writing is less than 1nm, and the uncertainty is less than 2%. The gratings have good uniformity, accuracy and stability, which verifies that the developed grating standard template can be used as an ideal physical standard in the traceability system of nano-geometric quantities. The nanometer grating spacing comparison measurement method based on Cr atomic lithography technology can provide a guarantee for the development and breakthrough of countrys nano-industry.
Key wordsmetrology    Cr atomic lithography    comparison measurement;grating standard material;self-traceable;flatting;AFM
收稿日期: 2022-05-17      发布日期: 2023-05-18
PACS:  TB921  
基金资助:上海市优秀学术/技术带头人计划(21XD1425000)
通讯作者: 雷李华(1985-),浙江丽水人, 上海市计量测试技术高级工程师,主要从事微纳米计量技术研究。Email:leilh@simt.com.cn     E-mail: leilh@simt.com.cn
作者简介: 陈凯晴(1996-),安徽萧县人,中国计量大学研究生,研究方向为纳米线宽的测量与表征。Email:1547144842@qq.com
引用本文:   
陈凯晴,管钰晴,邹文哲,邓晓,孔明,陈雅晴,熊英凡,傅云霞,雷李华. 基于Cr原子光刻技术的nm光栅间距比对测量定值方法研究[J]. 计量学报, 2023, 44(5): 671-678.
CHEN Kai-qing,GUAN Yu-qing,ZOU Wen-zhe,DENG Xiao,KONG Ming,CHEN Ya-qing,XIONG Ying-fan,FU Yun-xia,LEI Li-hua. Research on the Method of Nanometer Grating Spacing Comparison Measurement Based on Cr Atomic Lithography Technology. Acta Metrologica Sinica, 2023, 44(5): 671-678.
链接本文:  
http://jlxb.china-csm.org:81/Jwk_jlxb/CN/10.3969/j.issn.1000-1158.2023.05.01     或     http://jlxb.china-csm.org:81/Jwk_jlxb/CN/Y2023/V44/I5/671
京ICP备:14006989号-1
版权所有 © 《计量学报》编辑部
地址:北三环东路18号(北京1413信箱)  邮编:100029 电话:(010)64271480
本系统由北京玛格泰克科技发展有限公司设计开发  技术支持:support@magtech.com.cn