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计量学报  2022, Vol. 43 Issue (12): 1549-1553    DOI: 10.3969/j.issn.1000-1158.2022.12.04
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基于多层膜沉积的循迹式线宽标准样片
赵琳,韩志国,张晓东,许晓青,李锁印,吴爱华
中国电子科技集团公司 第十三研究所,河北 石家庄 050051
Tracking Type Line Width Standard Sample Based on Multilayer Film Deposition
ZHAO Lin,HAN Zhi-guo,ZHANG Xiao-dong,XU Xiao-qing,LI Suo-yin,WU Ai-hua
The 13th Institute of CETC, Shijiazhuang, Hebei 050051, China
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摘要 为了实现半导体行业内关键尺寸测量仪器的校准问题,展开了纳米尺寸线宽标准样片的研究工作。采用多层膜沉积技术研制了尺寸为20nm和50nm的纳米级线宽标准样片。针对标准样板整体尺寸小、仪器测量视场小所引起的校准时不便寻找的问题,以及由于样板线边缘质量问题导致每次测量不同位置结果相差太大的困扰,设计了定位循迹标志。共设计9组标志,每组标志9个标记格,每个标记格的宽度尺寸为0.5μm,标记格的间隔为2.5μm,每组标志之间的距离为100μm。采用半导体工艺进行加工,可以快速准确地寻找到标准的测量位置,保证了每次测量结果的重复性,有效提高了测量速度及准确性。
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赵琳
韩志国
张晓东
许晓青
李锁印
吴爱华
关键词 计量学线宽标准关键尺寸多层膜沉积循迹标记    
Abstract:In order to realize the calibration of critical dimension measuring instruments in the semiconductor industry, research work on nano-size line width standard samples has been launched.The nano-size line width standard samples with sizes of 20nm and 50nm were prepared by multi-layer film deposition technology.Aiming at the problem that it is difficult to find out when calibrating due to the small overall size of the standard template and the small measuring field of view of the instrument, and the problem that the quality of the template line edge leads to too large difference in the results of different positions measured each time, the positioning and tracking signs were designed. A total of 9 groups of signs were designed, each group of signs had 9 marker grids, the width of each sign was 0.5μm, and the interval of the signs was 2.5μm, the distance between each group of marks was 100μm.The semiconductor process can quickly and accurately find the standard measurement position, ensure the repeatability of each measurement result, and effectively improve the measurement speed and accuracy.
Key wordsmetrology    line width standard    critical dimension    multi-layer film deposition    tracking mark
收稿日期: 2021-11-25      发布日期: 2022-12-28
PACS:  TB921  
基金资助:国防技术基础计量项目(JSJL2019210B004)
通讯作者: 吴爱华(1980-),河北张家口人,中国电子科技集团公司第十三研究所研究员,主要从事无线电计量方面的的工作。Email:aihua.wu@139.com     E-mail: aihua.wu@139.com
作者简介: 赵琳(1983-),河北沧州人,中国电子科技集团公司第十三研究所高级工程师,主要研究方向为微电子计量。Email:zhaolin@cetc13.cn
引用本文:   
赵琳,韩志国,张晓东,许晓青,李锁印,吴爱华. 基于多层膜沉积的循迹式线宽标准样片[J]. 计量学报, 2022, 43(12): 1549-1553.
ZHAO Lin,HAN Zhi-guo,ZHANG Xiao-dong,XU Xiao-qing,LI Suo-yin,WU Ai-hua. Tracking Type Line Width Standard Sample Based on Multilayer Film Deposition. Acta Metrologica Sinica, 2022, 43(12): 1549-1553.
链接本文:  
http://jlxb.china-csm.org:81/Jwk_jlxb/CN/10.3969/j.issn.1000-1158.2022.12.04     或     http://jlxb.china-csm.org:81/Jwk_jlxb/CN/Y2022/V43/I12/1549
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