用于扫描电子显微镜校准的10μm格栅样板

doi:10.3969/j.issn.1000-1158.2022.12.03

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摘要扫描电子显微镜是半导体领域用于关键尺寸测量的重要仪器。为了保证仪器量值的准确和一致,需要对扫描电子显微镜进行校准。首先,针对校准规范中提到的正交畸变和线性失真度参数,采用半导体工艺,研制了一种标称值为10μm的格栅样板。其次,为了准确评价格栅特征的一致性,研究了一种矩形检测算法。测量过程中,使用该算法对样板的格栅特征进行测量,并把使用原子力显微镜获取的测量数据作为参考值。实验结果显示:矩形检测算法能够快速检测出格栅特征,测试数据稳定在6nm以内。此外,研制的格栅样板一致性好,一致性参数控制在0.2以内,能够应用于扫描电子显微镜的校准。

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	张晓东
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	韩志国
	许晓青
	吴爱华

关键词 ：计量学, 格栅样板, 扫描电子显微镜, 矩形检测算法, 原子力显微镜, 校准

Abstract：Scanning electron microscope (SEM) is an important instrument for critical dimension measurement in the semiconductor field. In order to ensure the accuracy and consistency of the instrument value, the SEM needs to be calibrated. First of all, for the orthogonal distortion and linear distortion parameters mentioned in the calibration specification, a lattice sample with a nominal value of 10μm is developed by using semiconductor technology. Secondly, in order to accurately evaluate the consistency of lattice features, a rectangle detection algorithm is studied. During the measurement process, the algorithm is used to measure the lattice features of the sample, and the measurement data obtained by the atomic force microscope (AFM) is used as the reference value. The experimental results show that the rectangle detection algorithm can detect the lattice features quickly, and the test data is stable within 6nm. In addition,the developed lattice sample has good consistency,and the consistency parameters are controlled within 0.2,which can applied to the calibration of SEM.

Key words： metrology lattice sample SEM rectangle detection AFM calibration

收稿日期: 2021-12-27 发布日期: 2022-12-28

PACS:

TB921

通讯作者: 吴爱华(1980-),河北张家口人,中国电子科技集团公司第十三研究所研究员,主要从事微电子计量技术研究。Email:wuaihua@cetc13.cn E-mail: aihua.wu@139.com

作者简介: 张晓东(1992-),山东东明人,中国电子科技集团公司第十三研究所工程师,主要从事微电子计量技术研究。Email:zhangxiaodong@cetc13.cn

引用本文:

张晓东,赵琳,李锁印,韩志国,许晓青,吴爱华. 用于扫描电子显微镜校准的10μm格栅样板[J]. 计量学报, 2022, 43(12): 1544-1548.
ZHANG Xiao-dong,ZHAO Lin,LI Suo-yin,HAN Zhi-guo,XU Xiao-qing,WU Ai-hua. 10μm Lattice Sample for Scanning Electron Microscope Calibration. Acta Metrologica Sinica, 2022, 43(12): 1544-1548.

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［1］韦亚一. 超大规模集成电路先进光刻理论与应用［M］. 北京:科学出版社, 2016.
［2］王智, 李琪, 黄鹭, 等. 扫描电镜纳米颗粒粒径自动检测算法［J］. 计量学报, 2020, 41 (10): 1199-1204.
Wang Z, Li Q, Huang L, et al. Automatic detection algorithm of nanoparticle size by scanning electron microscope ［J］. Acta Metrologica Sinica, 2020, 41 (10): 1199-1204.
［3］JJF 1916—2021 扫描电子显微镜校准规范［S］.
［4］许晓青, 李锁印, 赵琳, 等. 纳米线距标准样片的研制和表征［J］. 微纳电子技术,2019, 56 (9): 754-760.
Xu X Q, Li S Y, Zhao L, et al. Development and characterization of nanowire pitch standard samples［J］. Micronanoelectronic Technology,2019, 56 (9): 754-760..
［5］冯亚南, 李锁印, 韩志国, 等. 纳米台阶高度标准样块的研制与评价［J］. 宇航计测技术, 2016, 36 (5): 63-66, 88.
Feng Y N, Li S Y, Han Z G, et al. Development and evaluation of nanometer step height standard sample ［J］. Astronautic Metrology and Measurement Technology, 2016, 36 (5): 63-66, 88.
［6］张晓东, 赵琳, 韩志国, 等. 基于图像处理的线距测量方法［J］. 激光与光电子学进展, 2020, 57 (1): 89-93.
Zhang X D, Zhao L, Han Z G, et al. Line distance measurement method based on image processing ［J］. Progress in Laser and Optoelectronics, 2020, 57 (1): 89-93.
［7］江俊佳, 沈建新, 周喆, 等. 基于改进的概率Hough变换的转鼓装校技术研究［J］. 应用光学, 2020, 41 (2): 394-399.
Jiang J J, Shen J X, Zhou Z, et al. Research on drum assembly and calibration technology based on improved probabilistic Hough transform ［J］. Applied Optics, 2020, 41 (2): 394-399.
［8］李琪, 李伟, 施玉书, 等. 248nm紫外显微镜微纳线宽校准方法的研究［J］. 计量学报, 2015, 36 (1): 6-9.
Li Q, Li W, Shi Y S, et al. The Research of Nanometer Linewidth Calibration Method Used by 248nm Ultraviolet Microscope ［J］. Acta Metrologica Sinica, 2015, 36 (1): 6-9.
［9］尹传祥, 高思田, 赵贤云, 等. 计量型紫外显微镜微纳米线宽测量技术的研究［J］. 计量学报, 2015, 36 (6): 575-578.
Yin C X, Gao S T, Zhao X Y, et al. The Research of Micro-Nano Linewidth Measurement Technology on Metrological Ultraviolet Microscope ［J］. Acta Metrologica Sinica, 2015, 36 (6): 575-578.
［10］谢玮琦. 基于探针模型的原子力显微镜图像重构研究［D］. 沈阳: 沈阳建筑大学,2016.
［11］施玉书, 张树, 连笑怡, 等. 毫米级纳米几何特征尺寸计量标准装置多自由度激光干涉计量系统［J］. 计量学报, 2020, 41 (7): 769-774.
Shi Y S, Zhang S, Lian X Y, et al. Multi-DOF Laser Interferometry System for Metrological Standard Device for Nano-geometrical Characteristic Size in Millimeter Range［J］. Acta Metrologica Sinica, 2020, 41 (7): 769-774.
［12］郑学军, 徐武, 彭金锋, 等. 一种原子力显微镜探针磨损的摩擦性能修正方法:CN111190031A［P］. 2020.
［13］魏久焱. 原子力显微镜原子尺度三维力谱解算算法研究［D］. 太原:中北大学, 2020.
［14］庄正辉, 吴先球, 陈浩. 贝塞尔公式的推导及其物理意义探讨［J］. 大学物理实验, 2010, 23 (4): 80-82.
Zhuang Z H, Wu X Q, Chen H. The derivation of Bessel's formula and its physical meaning ［J］. College Physics Experiment, 2010, 23 (4): 80-82.
［15］赵琳, 张晓东, 李锁印, 等. 基于线距标准样片的扫描电镜校准方法探讨［J］. 计算机与数字工程, 2021, 49 (4): 644-648.
Zhao L, Zhang X D, Li S Y, et al. Discussion on the calibration method of scanning electron microscope based on line spacing standard sample ［J］. Computer and Digital Engineering, 2021, 49 (4): 644-648.
［16］刘俭, 谷康, 李梦周, 等. 扫描探针显微镜下微纳结构深度测量的校准方法［J］. 计量学报, 2019, 40 (4): 549-556.
Liu J, Gu K, Li M Z, et al. Calibration Method for Depth Measurement of Nano/microstructure in Scanning Probe Microscopy ［J］. Acta Metrologica Sinica, 2019, 40 (4): 549-556.