表面和亚表面特性对多层膜光栅成像对比度的影响

doi:10.3969/j.issn.1000-1158.2018.03.03

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摘要基于Si/SiO2材料对制备出名义节距为50 nm的多层膜光栅,重点分析了多层膜光栅研磨抛光过程中的亚表面损伤和湿法刻蚀均匀性问题。并利用原子力显微镜（AFM）和透射电子显微镜（TEM）对多层膜的截面粗糙度和刻蚀光栅结果进行了测量和分析。测量结果显示:多层膜光栅制备过程中的截面粗糙度降低和刻蚀均匀性的提高,有助于TEM测量获得均一的高成像对比度多层膜光栅图像。

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	张龙飞
	王星睿
	邓晓
	程鑫彬

关键词 ：计量学, 多层膜光栅, 成像对比度, 表面特性, 粗糙度, 刻蚀均匀性, TEM

Abstract：Based on the Si/SiO2 material, a multilayer film grating with nominal pitch of 50 nm is prepared. The problem of sub -surface damage during the grinding and polishing process and wet etching uniformity is analyzed emphatically. The cross-sectional roughness and the results of the etching grating are measured and analyzed by atomic force microscopy (AFM) and transmission electron microscopy (TEM). The results show that the decrease of the cross-sectional roughness and the uniformity of the etching in the preparation of the multilayer film grating helps to obtain a uniform high-contrast contrast multi-layer raster image for TEM measurement.

Key words： metrology multilayer film grating imaging contrast surface characteristics roughness etching uniformity TEM

收稿日期: 2017-05-23 发布日期: 2018-04-12

PACS:

TB92

基金资助:国家自然科学基金(51475335); 中国博士后科学基金（2017M611613）

通讯作者: 邓晓为本文通讯作者。1110490dengxiao@tongji.edu.cn E-mail: 1110490dengxiao@tongji.edu.cn

作者简介: 张龙飞（1993-）,男,河南临颍人,同济大学硕士研究生,主要从事纳米计量研究。1631873@tongji.edu.cn

引用本文:

张龙飞,王星睿,邓晓,程鑫彬. 表面和亚表面特性对多层膜光栅成像对比度的影响[J]. 计量学报, 2018, 39(3): 299-303.
ZHANG Long-fei,WANG Xing-rui,DENG Xiao,CHENG Xin-bin. Effect of Surface and Sub-surface Characteristics on the Contrast of Multilayer Film Grating Imaging. Acta Metrologica Sinica, 2018, 39(3): 299-303.

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