毫米级纳米几何特征尺寸计量标准装置多自由度激光干涉计量系统

施玉书,张树,连笑怡,李伟,李琪,黄鹭,高思田

计量学报 ›› 2020, Vol. 41 ›› Issue (7) : 769-774.

PDF(1460 KB)
PDF(1460 KB)
计量学报 ›› 2020, Vol. 41 ›› Issue (7) : 769-774. DOI: 10.3969/j.issn.1000-1158.2020.07.01
几何量计量

毫米级纳米几何特征尺寸计量标准装置多自由度激光干涉计量系统

  • 施玉书,张树,连笑怡,李伟,李琪,黄鹭,高思田
作者信息 +

Multi-DOF Laser Interferometry System for Metrological Standard Device for Nano-geometrical Characteristic Size in Millimeter Range

  • SHI Yu-shu,ZHANG Shu,LIAN Xiao-yi,LI Wei,LI Qi,HUANG Lu,GAO Si-tian
Author information +
文章历史 +

摘要

准确的纳米几何结构测量是提高集成电路、微纳机电系统和微纳技术产品的质量和性能的关键技术支撑,为了得到准确一致的测量结果,必须实现纳米尺度的量值溯源并建立量值的传递体系。为满足纳米几何结构计量从纳米尺度到毫米尺度的跨尺度计量需求,实验室研制了毫米级纳米几何特征尺寸计量标准装置,集成于该装置中的多自由度激光干涉计量系统,实现了测量结果向米定义SI单位的直接溯源。实验结果表明该系统能够在毫米级的测量范围内,实现纳米级的测量准确度,分辨力达到了亚纳米量级。

Abstract

Accurate measurement of nano-geometric structure is the key technical support to improve the quality and performance of integrated circuits, micro-nano electromechanical systems and micro-nano technology products.In order to obtain accurate measurement results, it is necessary to realize the measurement value traceability and built the value transfer system.To meet the metrology requirements of nanometer geometry structure from small to large range, the metrological calibration device for nano-geometrical characteristic size in millimeter range is developed which integrated with multi-degree of freedom (multi-DOF) laser interferometry system, and the results can be traced to SI units.The results shows that the device can achieve the measurement accuracy in nanoscale in the measurement range in millimeter level, and the resolution is achieved sub-nanometer scale.

关键词

计量学 / 纳米几何特征尺寸 / 多自由度激光干涉系统 / 激光干涉仪修正 / 计量标准装置

Key words

metrology / nano-geometrical characteristic size / multi-DOF laser interferometry system / correction of laser interferometer / metrological standard devicemetrology / nano-geometrical characteristic size / multi-DOF laser interferometry system / correction of laser interferometer / metrological standard device

引用本文

导出引用
施玉书,张树,连笑怡,李伟,李琪,黄鹭,高思田. 毫米级纳米几何特征尺寸计量标准装置多自由度激光干涉计量系统[J]. 计量学报. 2020, 41(7): 769-774 https://doi.org/10.3969/j.issn.1000-1158.2020.07.01
SHI Yu-shu,ZHANG Shu,LIAN Xiao-yi,LI Wei,LI Qi,HUANG Lu,GAO Si-tian. Multi-DOF Laser Interferometry System for Metrological Standard Device for Nano-geometrical Characteristic Size in Millimeter Range[J]. Acta Metrologica Sinica. 2020, 41(7): 769-774 https://doi.org/10.3969/j.issn.1000-1158.2020.07.01
中图分类号: TB921   

参考文献

[1]Leach R K, Boyd R, Burke T, et al. The European nanometrology landscape[J]. Nanotechnology, 2011, 22(6): 062001.
[2]国家集成电路产业发展推进纲要[EB/OL]. (2014-06-24)[2014-08-25]. http://www.miit.gov.cn/n11293472/n11293832/n11293907/n11368223/16044261.html.
[3]郭鑫, 施玉书, 皮磊, 等. Mirau干涉型微纳台阶高度测量系统的研究[J]. 计量学报, 2017,38(2): 141-144.
Guo X, Shi Y S, Pi L, et al. Research on Micro/nano Step Height Measurement System of Mirau Interference[J]. Acta Metrologica Sinica, 2017, 38(2): 141-144.
[4]林启敬, 吴昊, 张福政, 等. Cu/Ti纳米薄膜表面形貌的分形表征研究[J]. 计量学报, 2018,39(5): 593-597.
Lin Q J, Wu H, Zhang F Z, et al. Research on Fractal Characterization of the Surface Morphology of Cu/Ti Nano Thin Film[J]. Acta Metrologica Sinica, 2018,39(5): 593-597
[5]施玉书, 连笑怡, 王艺瑄, 等. AFM扫描过程的模拟及针尖形状反求[J]. 计量学报, 2019, 40(2): 177-182.
Shi Y S, Lian X Y, Wang Y X, et al. Simiulation of AFM Scanning Process and Tip Shape Estimation [J]. Acta Metrologica Sinica, 2019, 40(2): 177-182.
[6]王本力. NASA《2015技术路线图》对我国纳米技术发展的启示[J]. 新材料产业, 2018,(1): 26-28.
[7]卢明臻, 高思田, 杜华, 等. 计量型原子力测头模型研究及性能分析[J]. 纳米技术与精密工程, 2007, 5(1): 33-37.
Lu M Z, Gao S T, Du H, et al. Model of a Metrological AFM Head and Performance Analysis[J]. Nanotechnology and Precision Eng ineer ing Analysis,2007, 5(1): 33-37.
[8]卢明臻, 高思田, 杜华, 等. 大范围纳米结构测量系统原子力测头的研究 [C]//2007中国仪器仪表与测控技术交流大会. 北京, 2007: 654-662.
[9]Li W, Gao S T, Lu M Z, et al. Position measuring system in metrological atomic force microscope[J]. Optics and Precision Engineering, 2012,20(4): 796-802.
[10]来展. 激光干涉仪信号处理系统及纳米测量机控制系统的研究[D]. 杭州: 中国计量学院, 2011.
[11]Ducourtieux S, Poyet B. Development of a metrological atomic force microscope with minimized Abbe error and differential interferometer-based real-time position control [J]. Measurement Science & Technology, 2011, 22 (9): 094010
[12]Lu M Z, Gao S T, Li Q, et al. Long range metrological atomic force microscope with versatile measuring head [C]//Eighth International Symposium on Precision Engineering Measurement and Instrumentation.Chengdu, China, 2013.
[13]羡一民, 王科峰. 激光干涉仪技术及发展[J]. 工具技术, 2003, 37(11): 68-74.
[14]高宏堂, 高思田, 邵宏伟. 单频纳米激光干涉仪非线性误差及其修正方法[J]. 计量学报, 2006, 27(z1): 26-30.
Gao H T, Gao S T, Shao H W.Nonlinearity Error and the Correction Method for Homodyne Laser Interferometer with Nanometer Accuracy[J]. Acta Metrologica Sinica, 2006, 27(z1): 26-30.

基金

国家重点研发计划(2018YFF0212302,2016YFF0200602);中国计量科学研究院基本科研业务费项目(31-AKY1605)

PDF(1460 KB)

Accesses

Citation

Detail

段落导航
相关文章

/